Highlights

“Nonchemically Amplified Molecular Resists Based on Sulfonium-Functionalized Sulfone Derivatives for Sub-13 nm Nanolithography”
Tuesday, September 19, 2023

Date :2024-07-24
A series of molecular EUV resists based on a bis(4-butoxyphenyl) sulfone core attached to a varying number of radiation-sensitive triphenylsulfonium units were designed and synthesized.

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