“Fabrication of 53.2 nm pitch self-traceable gratings by laser-focused atomic deposition combined with extreme ultraviolet interference lithography”
Wednesday, March 1, 2023

The self-traceable Cr grating with a period of 212.8 nm prepared by laser-focused atomic deposition (LFAD) is used as the mask, and the second-order frequency doubling (k=2) of the Cr grating is performed by extreme ultraviolet interference lithography.