Beamline introduction

Beamline Layout and Specifications

Date :2024-07-23 【 A A A 】

Fig.1 Beamline layout

Source	Elliptically Polarized Undulator
Energy Range	85~150 eV
Photon Flux at sample	2*10¹⁴phs/s
Beam size at mask	~2*2 mm²
Interference patter period	30 nm
Sing exposure area	~0.4*0.4mm²

Table 1. Beamline station performance parameters

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