BL14B1

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Thin film in-situ heating/cooling equipment
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Temperature range: 450 degrees ~ liquid nitrogen; can be used for structural changes of thin film materials at low temperatures.
Capillary in-situ heating device
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Capillary inner diameter: 0.5-2 mm; heating temperature: up to 800 ℃, mainly used for powder samples in situ heating experiments.

In situ vacuum evaporation and diffraction equipment
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With two evaporation sources, each at temperatures up to 800°C, dual source co-evaporation is possible.

In situ glove box spin-coating device
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Water oxygen can be reduced to less than 1%, the spin-coating revolution range: 0-5000r/min; annealing temperature is: 0-350 ℃; mainly used for in situ study of structural changes in the preparation of thin film samples.

Ultra-high vacuum cryogenic diffraction device
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Temperature range: room temperature~liquid helium temperature; Vacuum: ~10-9mbar; Mainly used for sample measurements requiring ultra-low temperature conditions.