Exposure chamber: Photo-diode, mask sample stage, CCD camera.
Out-gassing detection chamber: mass spectrometer, sample rack.
Auxiliary laboratory: ICP etcher, electron beam evaporator, electron beam lithography system, ultraviolet lithography machine, ellipsometer, metallographic microscope, plasma asher, and laser cutter,etc.
Fig.1 Exposure chamber, out-gassing detection chamber and mask-sample stage.
