The Soft X-ray Interference Lithography Beamline (BL08U1B) was established in 2012 at the Shanghai Synchrotron Radiation Facility (SSRF), sharing the light source and front-end area with the Soft X-ray Spectroscopy Microscopy Beamline (BL08U1A).Soft X-ray Interference Lithography (XIL) is a novel advanced micro/nanofabrication technology that utilizes the interference fringes from two or more coherent X-ray beams to expose photoresist, capable of processing nanoscale structures with periods of tens or even down to a dozen nanometers. Compared to other lithographic methods, XIL technology offers high resolution, no proximity effect, contamination-free, and high throughput, enabling the reliable production of large-area, high-quality sub-50nm high-density periodic nanostructures. The construction of the soft X-ray interference lithography branch beamline aims to harness the low emittance, high brightness, and high coherence of soft X-rays at SSRF to establish a high-efficiency, low-cost, and high-precision nanofabrication technology platform.
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